This set of MCQs helps students to learn about introduction to MOS which describes the principals of forming MOS structure are similar to the metal-semiconductor (MS) contact structures, but the MOS structure is like a sandwich structure which have a thin layer of silicon oxides in the middle between metal and semiconductor (Si) layer.
What is the condition for non saturated region?
What is the condition for non conducting mode?
What is the condition for linear region?
Source and drain in nMOS device are isolated by ____________.
A single diode
Two diodes
Three diodes
Four diodes
nMOS devices are formed in ____________.
p-type substrate of high doping level
n-type substrate of low doping level
p-type substrate of moderate doping level
n-type substrate of high doping level
Electronics are characterized by ____________.
Low cost
Low weight and volume
Reliability
All of the mentioned
Speed power product is measured as the product of ____________.
Gate switching delay and gate power dissipation
Gate switching delay and gate power absorption
Gate switching delay and net gate power
Gate power dissipation and absorption
In depletion mode, source and drain are connected by ____________.
Insulating channel
Conducting channel
Vdd
Vss
In enhancement mode, device is in _________ condition.
Conducting
Non conducting
Partially conducting
Insulating
nMOS is ____________.
Donor doped
Acceptor doped
All of the mentioned
None of the mentioned
MOS transistor structure is ____________.
Symmetrical
Non symmetrical
Semi symmetrical
Pseudo symmetrical
pMOS is ____________.
Donor doped
Acceptor doped
All of the mentioned
None of the mentioned
pMOS is ____________.
Donor doped
Acceptor doped
All of the mentioned
None of the mentioned
Inversion layer in enhancement mode consists of excess of ____________.
Positive carriers
Negative carriers
Both in equal quantity
Neutral carriers
As source drain voltage increases, channel depth ____________.
Increases
Decreases
Logarithmically increases
Exponentially increases